Heat Treatment Equipment for Semiconductor Manufacturing

MELSS offers heat treatment equipment from JTEKT Thermo Systems Corporation, which is indispensable for the manufacturing process of compound power semiconductors. such as Si and SiC/GaN/Ga2O3, MEMS, solar cells,
VCSELs, and OLEDs.

VF-5900 Vertical Furnace for 300mm Wafers

Ideal for applications such as oxidation, diffusion, LPCVD and annealing

This furnace is a heat treatment system for silicon wafer, IGBT, polyimide and thin wafer oxidation, diffusion and CVD. As our flagship model, this furnace is equipped with a large-capacity stocker and features a short cycle time.

Model 200 Series Horizontal Furnaces for Mass Production and Experiments

Furnaces equipped with horizontal processing tubes.

From small experiments and research (R&D) tomass production, these furnaces can be designed to meet users’ needs.

These horizontal furnaces can be used for solar battery and photovoltaic power system (PV) production as well as silicon wafers.

Lamp annealing system

RLA-4100-V

Using multiple halogen lamps as heat sources, wafers can be heat-treated in a short time with high accuracy.

Vacuum load-lock capability improves throughput. Supports 6 to 8 inch various wafers including Si, GaN, and SiC.

Clean oven system

An optimal convection heating system for polyimide post-processing (back end process) and resist curing.

This clean oven processes 300-mm (12-inch) wafers for semiconductor production. With FOUPs, 50 wafers can be fully automatically processed for each chamber. The system can be used for low-temperature processing of polyimide and other materials.